In the process industry, tanks, reactors, and exhaust gas systems are often inerted with nitrogen to reduce explosion risks. Reliable inline oxygen measurement is a critical requirement in this regard and must often meet SIL2 requirements. In small process pipelines, this was a challenge for a long time, because classic TDL analyzers were not suitable for this. The GPro500 Wafer changes that and makes Reliable TDL oxygen measurement possible from DN50.
Conventional TDL analyzers work with a laser and detector on opposite sides of the pipe, making installation and alignment complex. The GPro500 combines both in a single housing with just one process connection. A corner-cube reflector It reflects the laser beam back parallel, thereby doubling the optical path length. This simplifies installation and eliminates alignment problems.
For applications requiring a higher resolution, the GPro500 can be equipped with the innovative Multi-Reflection Tool (MR2/MR3). The laser then passes the physical path not twice, but four to six times. The installation remains compact while the measurement resolution increases. A resolution of 0.1% oxygen with a response time of less than two seconds is possible. Optional filters and an easily heated wafer protect the optics against contamination and condensation, ensuring reliable measurements remain possible in demanding process conditions.
The GPro500 Wafer brings maintenance-free inline TDL oxygen measurement to small process pipelines where this was previously technically barely feasible. In this way, the solution combines high measurement reliability, compact installation and SIL2 compliance for safety-critical applications.
Visit our stand 7E026 during WoTS and discover more about the GPro500 Wafer.