ELSCOLOB | GPro500 Wafer
In the process industry, tanks, reactors, and exhaust gas systems are often inerted with nitrogen to limit explosion risks. Reliable inline oxygen measurement is a critical requirement in this context and must often meet SIL2 standards. In small process pipelines, this was a challenge for a long time, as classic TDL analyzers were not suitable for this purpose. The GPro500 Wafer changes this and enables reliable TDL oxygen measurement starting from DN50.
Conventional TDL analyzers use a laser and detector on opposite sides of the pipe, making installation and alignment complex. The GPro500 combines both in a single housing with just one process connection. A corner-cube reflector bounces the laser beam back parallel, thereby doubling the optical path length. This simplifies installation and eliminates alignment problems.
For applications requiring higher resolution, the GPro500 can be equipped with the innovative Multi-Reflection Tool (MR2/MR3). The laser then passes through the physical path four to six times, instead of twice. The setup remains compact while the measurement resolution increases. A resolution of 0.1% oxygen with a response time of less than two seconds is possible. Optional filters and an easily heated wafer protect the optics against contamination and condensation, ensuring reliable measurements remain possible in demanding process conditions.
The GPro500 Wafer brings maintenance-free inline TDL oxygen measurement to small process pipelines where this was previously technically barely feasible. In this way, the solution combines high measurement reliability, compact installation, and SIL2 compliance for safety-critical applications.